Development of the Roll Type Incremental Micro Pattern Imprint System for Large Area Pattern Replication

Abstract : Flexible display has been attracting attention in the research field of next generation display in recent years. And polymer is a candidate material for flexible displays as it takes advantages including transparency, light weight, flexibility and so on. Rolling process is suitable and competitive process for the high throughput of flexible substrate such as polymer. In this paper, we developed a prototype of roll-to-flat (R2F) thermal imprint system for large area micro pattern replication process, which is one the key process in the fabrication of flexible displays. Tests were conducted to evaluate the system feasibility and process parameters effect, such as flat mold temperature, loading pressure and rolling speed. 100 mm × 100 mm stainless steel flat mold and commercially available polycarbonate sheets were used for tests and results showed that the developed R2F system is suitable for fabrication of various micro devices with micro pattern replication on large area.
Type de document :
Communication dans un congrès
Svetan Ratchev. 5th IFIP WG 5.5 International Precision Assembly Seminar (IPAS), Feb 2010, Chamonix, France. Springer, IFIP Advances in Information and Communication Technology, AICT-315, pp.97-104, 2010, Precision Assembly Technologies and Systems. 〈10.1007/978-3-642-11598-1_11〉
Liste complète des métadonnées

Littérature citée [19 références]  Voir  Masquer  Télécharger

https://hal.inria.fr/hal-01055696
Contributeur : Hal Ifip <>
Soumis le : mercredi 13 août 2014 - 11:45:53
Dernière modification le : mardi 8 août 2017 - 17:09:22
Document(s) archivé(s) le : jeudi 27 novembre 2014 - 00:27:17

Fichier

Paper_26_-_SONG.pdf
Fichiers produits par l'(les) auteur(s)

Licence


Distributed under a Creative Commons Paternité 4.0 International License

Identifiants

Citation

Jung-Han Song, Hye-Jin Lee, Shuhuai Lan, Nak-Kyu Lee, Geun-An Lee, et al.. Development of the Roll Type Incremental Micro Pattern Imprint System for Large Area Pattern Replication. Svetan Ratchev. 5th IFIP WG 5.5 International Precision Assembly Seminar (IPAS), Feb 2010, Chamonix, France. Springer, IFIP Advances in Information and Communication Technology, AICT-315, pp.97-104, 2010, Precision Assembly Technologies and Systems. 〈10.1007/978-3-642-11598-1_11〉. 〈hal-01055696〉

Partager

Métriques

Consultations de la notice

97

Téléchargements de fichiers

431