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Precisely Assembled Multi Deflection Arrays – Key Components for Multi Shaped Beam Lithography
Abstract : Multi shaped beam lithography requires the precise and durable alignment and fixation of MEMS based Multi Deflection Arrays on stable ceramic system platforms using vacuum and high temperature compatible interconnection and joining technologies. Micron accuracy during assembly is accomplished by mark detection using image processing and 3DOF alignment procedures; while interconnection as well as precise fixation is carried out using a fine pitch solder bumping process. Qualification investigations using electron beam equipment show that the precisely aligned multi shaped beam arrays are able to deflect the electron beams in accordance with the simulation results.
Cited literature [6 references]
https://hal.inria.fr/hal-01363878
Contributor : Hal Ifip <>
Submitted on : Monday, September 12, 2016 - 10:04:20 AM
Last modification on : Wednesday, June 17, 2020 - 12:12:02 PM
Long-term archiving on: : Tuesday, December 13, 2016 - 12:48:09 PM
Contributor : Hal Ifip <>
Submitted on : Monday, September 12, 2016 - 10:04:20 AM
Last modification on : Wednesday, June 17, 2020 - 12:12:02 PM
Long-term archiving on: : Tuesday, December 13, 2016 - 12:48:09 PM
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