Edge- and substrate-based effects for watercolor stylization

Santiago Montesdeoca 1 Hock Soon Seah 1 Pierre Bénard 2 Romain Vergne 3 Joëlle Thollot 3 Hans-Martin Rall 1 Davide Benvenuti 1
1 Nanyang Technological University [Singapour]
2 MANAO - Melting the frontiers between Light, Shape and Matter
LaBRI - Laboratoire Bordelais de Recherche en Informatique, Inria Bordeaux - Sud-Ouest, LP2N - Laboratoire Photonique, Numérique et Nanosciences
3 MAVERICK - Models and Algorithms for Visualization and Rendering
Inria Grenoble - Rhône-Alpes, LJK - Laboratoire Jean Kuntzmann, INPG - Institut National Polytechnique de Grenoble
Abstract : We investigate characteristic edge-and substrate-based effects for watercolor stylization. These two fundamental elements of painted art play a significant role in traditional watercolors and highly influence the pigment's behavior and application. Yet a detailed consideration of these specific elements for the stylization of 3D scenes has not been attempted before. Through this investigation, we contribute to the field by presenting ways to emulate two novel effects: dry-brush and gaps & overlaps. By doing so, we also found ways to improve upon well-studied watercolor effects such as edge-darkening and substrate granulation. Finally, we integrated controllable external lighting influences over the watercolorized result, together with other previously researched watercolor effects. These effects are combined through a direct stylization pipeline to produce sophisticated watercolor imagery, which retains spatial coherence in object-space and is locally controllable in real-time.
Keywords : watercolor dry-brush gaps & overlaps direct stylization
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Conference papers
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https://hal.inria.fr/hal-01539599
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Submitted on : Thursday, June 15, 2017 - 10:30:22 AM
Last modification on : Wednesday, October 2, 2019 - 2:36:09 PM
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Santiago Montesdeoca, Hock Soon Seah, Pierre Bénard, Romain Vergne, Joëlle Thollot, et al.. Edge- and substrate-based effects for watercolor stylization. Expressive 2017, the Symposium on Computational Aesthetics, Sketch-Based Interfaces and Modeling, and Non-Photorealistic Animation and Rendering, Jul 2017, Los Angeles, United States. pp.10, ⟨10.1145/3092919.3092928⟩. ⟨hal-01539599⟩

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