A Random Walk Approach for Light Scattering in Material

Klaus Simon 1 Beat Trachsler 1
1 EMPA - Swiss Federal Laboratories for Materials Science and Technology [Thun]
Abstract : Understanding reflection is one of the key competences in graphic arts industry. A very popular approach was given by Kubelka andMunk [1931] who derived a simple relationship between the scattering and absorption coefficients and the overall reflectance. This paper presents an alternative approach which describes the behavior of light in matter as a special kind of random walk.
Keywords : Chebyshev Polynomials Catalan Numbers Narayana Numbers Random Walk Kubelka-Munk Light Scattering First-Passage Time Probability
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Communication dans un congrès
Cyril Banderier and Christian Krattenthaler. Discrete Random Walks, DRW'03, 2003, Paris, France. Discrete Mathematics and Theoretical Computer Science, DMTCS Proceedings vol. AC, Discrete Random Walks (DRW'03), pp.289-300, 2003, DMTCS Proceedings
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Klaus Simon, Beat Trachsler. A Random Walk Approach for Light Scattering in Material. Cyril Banderier and Christian Krattenthaler. Discrete Random Walks, DRW'03, 2003, Paris, France. Discrete Mathematics and Theoretical Computer Science, DMTCS Proceedings vol. AC, Discrete Random Walks (DRW'03), pp.289-300, 2003, DMTCS Proceedings. 〈hal-01183928〉

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