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A Random Walk Approach for Light Scattering in Material

Klaus Simon 1 Beat Trachsler 1
1 EMPA - Swiss Federal Laboratories for Materials Science and Technology [Thun]
Abstract : Understanding reflection is one of the key competences in graphic arts industry. A very popular approach was given by Kubelka andMunk [1931] who derived a simple relationship between the scattering and absorption coefficients and the overall reflectance. This paper presents an alternative approach which describes the behavior of light in matter as a special kind of random walk.
Keywords : Chebyshev Polynomials Catalan Numbers Narayana Numbers Random Walk Kubelka-Munk Light Scattering First-Passage Time Probability
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https://hal.inria.fr/hal-01183928
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Klaus Simon, Beat Trachsler. A Random Walk Approach for Light Scattering in Material. Discrete Random Walks, DRW'03, 2003, Paris, France. pp.289-300. ⟨hal-01183928⟩

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